Niobium Sputtering Target

Niobium Sputtering Target

Niobium Sputterig Target

Purity: 99.5%-99.99%

Material: R04200, R04210

  • Custom sizes and standard sizes in stock
  • Quick Lead Time
  • Competitive Price
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Niobium Sputtering Target is made of high-purity niobium metal material, possessing small grain size. These properties enables the formation of uniform and dense films. As a leading supplier and manufacturer of premium niobium products, Heeger Materials leverages advanced machining centers to deliver high-precision niobium sputtering targets for wide ranges of applications.

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Or email us at sales@heegermaterials.com.

Niobium Sputtering Data Sheet

Reference:HMST16
Material:R04200, R04210
Purity:99.5%-99.99%
Density:8.57 g/cm3
Shape:Flat, Rotary, or Customized
Bonding:Unbongidng or Bonding

Niobium Sputtering Target

Niobium is a rare, silvery-gray transition metal with excellent corrosion resistance, electric conductivity, and high-temperature stability. Niobium Sputtering Target can usually reach a purity of more than 99.95% and have a small grain size, which ensures the quality of the coating. Niobium Sputtering Target is commonly applied in semiconductor manufacturing, thin film coatings, electronic components, etc. HM can offer bonding services according to specific requirements.

  • Niobium Sputtering Target_Round Shape
    Niobium Sputtering Target_Round Shape
  • Niobium Sputtering Target_Special Shape
    Niobium Sputtering Target_Special Shape
  • Niobium Sputtering Target_Rotary Type
    Niobium Sputtering Target_Rotary Type

Niobium Sputtering Target Material Chemical Composition

MaterialMain Element (%)Impurities (≤%)
NbFeSiNiWMoTiTaZrHfOCHN
RO4200Bal.0.00400.00400.00200.00500.00500.00200.07000.02000.02000.01500.00400.00150.0030
RO4210Bal.0.01000.01000.00500.02000.01000.00400.10000.02000.02000.02000.01000.00150.0100

Niobium Sputtering Target Specifications

Material TypeNiobiumCoefficient of Thermal Expansion7.3 x 10-6/K
SymbolNbTheoretical Density (g/cc)8.57
Atomic Weight92.90638Z Ratio0.492
Atomic Number41SputterDC
Color/AppearanceGray, MetallicMax Power Density (Watts/Square Inch)100*
Thermal Conductivity54 W/m.KType of BondIndium, Elastomer
Melting Point (°C)2,468CommentsAttacks W source.

Niobium Sputtering Target Stock Dimensions

Circular Sputtering TargetsDiameter1.0″
2.0″
3.0″
4.0″
5.0″
6.0″
up to 21″
Rectangular Sputtering TargetsWidth x Length5″ x 12″
5””x 15″
5″ x 20″
5″ x 22″
6″ x 20″
Thickness0.125″, 0.25″

Niobium Sputtering Target Production Process

Generally prepared by powder metallurgy method, the purity of niobium powder should be above 99.95%. The specific process is as follows:

  • Put the niobium powder in the vacuum heat treatment furnace for pre-gassing, then introduce hydrogen and continue heating for degassing.
  • The degassed niobium powder is sintered once by vacuum hot pressing.
  • The primary sintered product is passed through a hot isostatic press to complete the secondary sintering.
  • After the secondary sintering, the whole surface of the product is ground by machining to get the final product.

Niobium Sputtering Target Applications

  • Flat Panel Displays and Liquid Crystal Displays: Niobium sputtering targets are used to manufacture high-quality displays that provide clear images and high contrast.
  • Optical Lenses: In optical devices, niobium sputtering targets are used for coating to improve light transmission and durability.
  • Solar Cells: Niobium sputtering targets are also used to produce solar cells to improve photovoltaic conversion efficiency.
  • Glass Coating: Niobium sputtering targets are used in the surface coating of energy-saving glass with anti-reflective and heat-insulating properties.

Niobium Sputtering Target Packaging

The Niobium Sputtering Target is carefully placed in wooden cases or cartons with additional support from soft materials to prevent any shifting during transportation. This packaging method guarantees the integrity of the products throughout the delivery process.

Metal Packing

Niobium Properties

ItemValue
Atomic number41
Crystal structureBody centred cubic
Electronic structureKr 4d⁴ 5s¹
Valences shown2, 3, 4, 5
Atomic weight( amu )92.9064
Thermal neutron absorption cross-section( Barns )1.15
Photo-electric work function( eV )4.3
Atomic radius – Goldschmidt( nm )0.147
Ionisation potential( No./eV )3/ 25.0
Ionisation potential( No./eV )2/ 14.3
Ionisation potential( No./eV )6/ 103
Ionisation potential( No./eV )1/ 6.88
Ionisation potential( No./eV )4/ 38.3
Ionisation potential( No./eV )5/ 50.5
ItemValue
Material condition / TemperAnnealed (Soft)
Material condition / TemperUn-annealed (Hard)
Poisson’s ratio0.397
Poisson’s ratio0.397
Bulk modulus( GPa )170.3
Bulk modulus( GPa )170.3
Tensile modulus( GPa )104.9
Tensile modulus( GPa )104.9
Izod toughness( J m⁻¹ )10-120
Hardness – Vickers( kgf mm⁻² )115
Hardness – Vickers( kgf mm⁻² )160
Tensile strength( MPa )330
Tensile strength( MPa )585
Yield strength( MPa )550
Yield strength( MPa )240
ItemValue
Electrical resistivity( µOhmcm )16@20@20°C
Superconductivity critical temperature( K )9.25
Temperature coefficient( K⁻¹ )0.0026@0-100°C
ItemValue
Boiling point( °C )4742
Density( gcm⁻³ )8.57@20°C
ItemValue
Melting point( °C )2468
Latent heat of evaporation( J g⁻¹ )7360
Latent heat of fusion( J g⁻¹ )290
Specific heat( J K⁻¹ kg⁻¹ )268@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )53.7@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )7.2@0-100°C

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To customize your niobium sputtering target, please provide the following details:

  1. Diameter (for the circular sputtering targets)
  2. Width × Length (for the rectangular sputtering targets)
  3. Thcikness (for the sputtering targets)
  4. Purity of the material
  5. Backing Plate (If bonding service is required, please specify the material and dimensions of the backing plate.）
  6. Quantity of the products you need
  7. Alternatively, you can provide a drawing with your specifications.

Once we have these details, we can provide you with a quote within 24 hours.

We carry a wide variety of niobium and niobium alloy products in stock, and for these, there is generally no minimum order requirement. However, for custom orders, we typically set a minimum order value of $200. The lead time for stock items is usually 1-2 weeks, while custom orders usually take 3-4 weeks, depending on the specifics of the order.

DFARS (Defense Federal Acquisition Regulation Supplement) compliance is primarily concerned with the sourcing of materials for defense-related applications in the United States. According to DFARS, certain materials used in defense must be sourced from the United States or qualifying countries.

If you have specific niobium materials that are subject to DFARS, please let us know in advance and we will confirm.

At Heeger Materials Inc., we take this responsibility seriously. We adhere to all applicable laws and regulations, including Section 1502 of the Dodd-Frank Act. Our company operates with a strict code of ethics and is committed to only partnering with suppliers who share our dedication to responsible sourcing. We support the initiatives and programs aimed at promoting “conflict-free” supply chains and work diligently to ensure that our products meet these standards.

Heeger Materials Inc., established in 2016 in Colorado, USA, is a specialized supplier and manufacturer of tantalum and tantalum alloys. With extensive expertise in supply and export, we offer competitive pricing and customized solutions tailored to specific requirements, ensuring outstanding quality and customer satisfaction. As a professional provider of refractory metals, specialty alloys, spherical powders, and various advanced materials, we serve the research, development, and large-scale industrial production needs of the scientific and industrial sectors.

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Other Niobium Products

Heeger Metal offers a comprehensive range of niobium and niobium alloy products, including powders and finished parts, with customization options available. Known for their exceptional strength, corrosion resistance, and high-temperature stability, these materials are ideal for aerospace, electronics, and chemical processing applications. Our high-purity niobium ensures reliable performance and durability in the most demanding environments.

Sputtering Targets Products

Heeger Metal offers a wide selection of high-performance sputtering targets made from materials like titanium, copper, aluminum, and rare earth metals. Our custom sputtering targets are precision-engineered to meet the demands of industries such as semiconductor manufacturing, photovoltaic, and electronics. With superior purity and consistency, our sputtering targets deliver exceptional film deposition performance, making them ideal for thin-film coating, sputtering, and PVD (Physical Vapor Deposition) applications.

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