Gold Sputtering Target
Gold Sputtering Target Purity: ≥99.95%, or customized Gold Sputtering Target is made of high-purity gold metal through precise techniques and is…
Gold Sputtering Target Purity: ≥99.95%, or customized Gold Sputtering Target is made of high-purity gold metal through precise techniques and is…
Molybdenum Sputtering Target Purity: 99.95%-99.99% Material: Pure Mo361, MoTZM (Mo364), Mo-Lanthanoxid (ML) Molybdenum Sputtering Target is a thin film deposition material,…
Niobium Sputterig Target Purity: 99.5%-99.99% Material: R04200, R04210 Niobium Sputtering Target is made of high-purity niobium metal material, possessing small grain…
Palladium Sputtering Target Purity: ≥99.95%, or customized Shape: Disc, Rectangular, Tube, or customized Palladium Sputtering Target is made from high-purity palladium…
Platinum Sputtering Target Purity: ≥99.95% or ≥99.99% Shape: Disc, Rectangular, Tube, or customized Platinum Sputtering Target is made from high-purity platinum…
Tantalum Sputtering Target Purity: 99.9%, 99.95%, 99.99%, 99.999% Material: R05200, R05400 Tantalum Sputtering Target is made from high-purity tantalum material through…
Titanium Sputtering Target Material: Gr.1, Gr.2, Gr.3, Gr.7, Gr.9, Gr.12, Gr.16, etc. Purity: 99.95%-99.995% Titanium Sputtering Target is one of the…
Tungsten Sputtering Target Material: Pure Tungsten Purity: 99%-99.999% Tungsten Sputtering Target is made of high-purity tungsten powder, as high as 99.999%….