Tungsten Sputtering Target

Material: Pure Tungsten

Purity: 99%-99.999%

Custom sizes and standard sizes in stock
Quick Lead Time
Competitive Price

Tungsten Sputtering Target is made of high-purity tungsten powder, as high as 99.999%. It possesses the advantages of high melting point, high density, corrosion resistance, and good thermal stability. As a leading supplier and manufacturer of premium tungsten products, Heeger Materials leverages advanced machining centers to deliver high-precision sputtering targets, evaporation sources, and other deposition materials for wide ranges of applications.

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Tungsten Sputtering Target Data Sheet

Reference:	HMST24
Material:	Tungsten
Purity:	99%, 99.9%, 99.95%, 99.99%, 99.999%
Shape:	Disc, Rectangular, Rotary, or Customized
Bonding:	Unbonding, or Bonding

Tungsten Sputtering Target

Tungsten Sputtering Target is a high-performance deposition material, widely used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD), and optical applications. HM can offer customized solutions and bonding services to meet specific requirements.

Tungsten Sputtering Target Material Chemical Composition

W (>%)	Chemical Content (<%)
99.999 W1	Fe	Ca	Be	Sn	Al	Ni	Zn	Sb	Pt	K	Ta	Na
	0.0001	0.00005	0.000005	0.000005	0.00005	0.00001	0.00005	0.00005	0.00003	0.000005	0.0001	0.00005
	Cr	Pb	As	Mg	Ti	Bi	Mo	Cd	Cu	Ba	Co	Mn
	0.000005	0.00001	0.00005	0.00005	0.000005	0.00001	0.00001	0.000005	0.000007	0.00001	0.000005	0.000005
99.99 W2	Fe	Ca	Be	Sn	Al	Ni	Zn	Sb	Pt	K	O	Na
	0.0001	0.00045	0.0001	0.0001	0.0001	0.0001	0.0001	0.0001	0.0001	0.0005	0.0040	0.0009
	Cr	Pb	As	Mg	Ti	Bi	Mo	Cd	Cu	Ba	Co	Mn
	0.0001	0.0001	0.0001	0.0001	0.0001	0.0001	0.0002	0.0001	0.0001	0.0001	0.0001	0.0001
99.95 W3	Fe	Ca	P	Sn	Al	Ni	N	Sb	Si	O	Pb	As
	0.005	0.003	0.001	0.0001	0.002	0.003	0.003	0.001	0.003	0.003	0.0001	0.002
	Mg	C	Bi	Mo
	0.002	0.005	0.0001	0.001

Tungsten Sputtering Target Specifications

Material Type	Tungsten	Coefficient of Thermal Expansion	4.5 x 10^-6/K
Symbol	W	Theoretical Density (g/cc)	19.25
Atomic Weight	183.84	Z Ratio	0.163
Atomic Number	74	Sputter	DC
Color/Appearance	Grayish White, Lustrous, Metallic	Max Power Density (Watts/Square Inch)	100*
Thermal Conductivity	174 W/m.K	Type of Bond	Indium, Elastomer
Melting Point (°C)	3,410	Comments	Forms volatile oxides. Films are hard and adherent.

Tungsten Sputtering Target Stock Dimensions

Circular Sputtering Targets	Diameter	1.0″ 2.0″ 3.0″ 4.0″ 5.0″ 6.0″ up to 21″
Rectangular Sputtering Targets	Width x Length	5″ x 12″ 5””x 15″ 5″ x 20″ 5″ x 22″ 6″ x 20″
Thickness		0.125″, 0.25″

Tungsten Sputtering Target Advantages

High purity, sintered, and cast tungsten sputtering targets up to 99.95% and beyond.
Rapid prototyping, powder metallurgy, and direct pressing.
High density, the density of the tungsten sputtering target after casting can be more than 19.1g/cm3.
The wide application of the powder metallurgy method makes the cost of tungsten target lower than that of other target materials, such as titanium.
Uniform composition and structure, improve the deflection force of the tungsten target.
Fine particle size, grain uniformity, other axes, high concentration, and coating product quality are higher.

Tungsten Sputtering Targets Production Process

Generally prepared by powder metallurgy method, the purity of tungsten powder should be above 99.95%, and the particle size should be between 3.2-4.2 μm. The specific process is as follows:

Put the tungsten powder in the vacuum heat treatment furnace for pre-gassing, then introduce hydrogen and continue heating for degassing.
The degassed tungsten powder is sintered once by vacuum hot pressing.
The primary sintered product is passed through a hot isostatic press to complete the secondary sintering.
After the secondary sintering, the whole surface of the product is ground by machining to get the final product.

Tungsten Sputtering Target Applications

Semiconductor Manufacturing: In the manufacture of integrated circuits and microelectronic devices, tungsten sputtering targets are used to deposit conductive or barrier layers by Physical Vapor Deposition (PVD) technology.
Photovoltaic Industry: Tungsten sputtering targets are used to produce solar panels to form highly efficient photovoltaic conversion layers through sputtering coating, improving the efficiency and stability of solar cells.
Hard Coatings and Tool Manufacturing: Tungsten’s hardness and wear resistance make it a high-performance coating material. Tungsten sputtering targets are used to produce hard coatings for metal cutting tools, molds, etc. to improve their durability and wear resistance.
Military and Aerospace: The high density and high strength properties of tungsten sputtering targets make them important in manufacturing military protective equipment and aerospace devices.
Electronic Components: The high thermal conductivity and electrical conductivity of the tungsten sputtering target make it play an important role in the heat dissipation material and electromagnetic shielding material of electronic devices.

Tungsten Sputtering Target Packaging

The Tungsten Sputtering Target is carefully placed in wooden cases or cartons, with additional support from soft materials, to prevent shifting during transportation. This packaging method guarantees the integrity of the products throughout the delivery process.

Tungsten Properties

Item	Value
Atomic number	74
Crystal structure	Body centred cubic
Electronic structure	Xe 4f¹⁴ 5d⁴ 6s²
Valences shown	2,3,4,5,6
Atomic weight( amu )	183.85
Thermal neutron absorption cross-section( Barns )	18.5
Photo-electric work function( eV )	4.55
Natural isotope distribution( Mass No./% )	183/ 14.3
Natural isotope distribution( Mass No./% )	182/ 26.3
Natural isotope distribution( Mass No./% )	186/ 28.6
Natural isotope distribution( Mass No./% )	180/ 0.1
Natural isotope distribution( Mass No./% )	184/ 30.7
Atomic radius – Goldschmidt( nm )	0.141
Ionisation potential( No./eV )	1/ 7.98
Ionisation potential( No./eV )	2/ 17.7

Item	Value
Material condition	Annealed (Soft)
Material condition	Un-annealed (Hard)
Poisson’s ratio	0.28
Poisson’s ratio	0.28
Bulk modulus( GPa )	311
Bulk modulus( GPa )	311
Tensile modulus( GPa )	411
Tensile modulus( GPa )	411
Hardness – Vickers( kgf mm⁻² )	360
Hardness – Vickers( kgf mm⁻² )	500
Tensile strength( MPa )	550-620
Tensile strength( MPa )	1920
Yield strength( MPa )	550

Item	Value
Electrical resistivity( µOhmcm )	5.4@20@20°C
Superconductivity critical temperature( K )	0.0154
Temperature coefficient( K⁻¹ )	0.0048@0-100°C
Thermal emf against Pt (cold 0C – hot 100C)( mV )	1.12

Item	Value
Boiling point( °C )	5660
Density( gcm⁻³ )	19.3@20°C

Item	Value
Melting point( °C )	3410
Latent heat of evaporation( J g⁻¹ )	4009
Latent heat of fusion( J g⁻¹ )	192
Specific heat( J K⁻¹ kg⁻¹ )	133@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	173@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	4.5@0-100°C

Download

SAFETY DATA SHEET (SDS) – Tungsten Metal

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To customize your tungsten sputtering target, please provide the following details:

Diameter (for the circular sputtering targets)
Width × Length (for the rectangular sputtering targets)
Thcikness (for the sputtering targets)
Purity of the material
Backing Plate (If bonding service is required, please specify the material and dimensions of the backing plate.）
Quantity of the products you need
Alternatively, you can provide a drawing with your specifications.

Once we have these details, we can provide you with a quote within 24 hours.

We carry a wide variety of tungsten and tungsten alloy products in stock, and for these, there is generally no minimum order requirement. However, for custom orders, we typically set a minimum order value of $200. The lead time for stock items is usually 1-2 weeks, while custom orders usually take 3-4 weeks, depending on the specifics of the order.

DFARS (Defense Federal Acquisition Regulation Supplement) compliance is primarily concerned with the sourcing of materials for defense-related applications in the United States. According to DFARS, certain materials used in defense must be sourced from the United States or qualifying countries.

If you have specific tungsten materials that are subject to DFARS, please let us know in advance and we will confirm.

At Heeger Materials Inc., we take this responsibility seriously. We adhere to all applicable laws and regulations, including Section 1502 of the Dodd-Frank Act. Our company operates with a strict code of ethics and is committed to only partnering with suppliers who share our dedication to responsible sourcing. We support the initiatives and programs aimed at promoting “conflict-free” supply chains and work diligently to ensure that our products meet these standards.

Heeger Materials Inc., established in 2016 in Colorado, USA, is a specialized supplier and manufacturer of tungsten and tungsten alloys. With extensive expertise in supply and export, we offer competitive pricing and customized solutions tailored to specific requirements, ensuring outstanding quality and customer satisfaction. As a professional provider of refractory metals, specialty alloys, spherical powders, and various advanced materials, we serve the research, development, and large-scale industrial production needs of the scientific and industrial sectors.

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Heeger Metal provides a wide range of tungsten and tungsten alloy products, from powders to finished components, with customization options available. Known for their outstanding strength, high melting point, and excellent wear and corrosion resistance, these materials are ideal for aerospace, electronics, and industrial applications. Our high-purity tungsten ensures exceptional durability and performance in even the most extreme conditions.

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