Molybdenum Sputtering Target

Purity: 99.95%-99.99%

Material: Pure Mo₃₆₁, MoTZM (Mo₃₆₄), Mo-Lanthanoxid (ML)

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Molybdenum Sputtering Target is a thin film deposition material, made of high-purity molybdenum or molybdenum alloy. It exhibits high purity and density, widely allpied in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD), and optical areas. As a leading supplier and manufacturer of premium molybdenum products, Heeger Materials leverages advanced machining centers to deliver high-precision molybdenum and molybdenum alloy sputtering targets for wide ranges of applications.

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Molybdenum Sputtering Target Data Sheet

Reference:	HMST15
Material:	Pure Mo₃₆₁, MoTZM (Mo₃₆₄), Mo-Lanthanoxid (ML)
Purity:	99.95%-99.99%
Density:	10.22 g/cm³
Shape:	Flat, Rotary, or Customized
Bonding:	Unbonding or Bonding

Molybdenum Sputtering Target

Molybdenum is a silver-grey metal with a melting point of 2623 ℃ and a density of 10.2 g/cm³. It is one of the commercially available metals with the lowest coefficient of thermal expansion. Molybdenum Sputtering Targets are made of high-purity molybdenum or molybdenum alloys, retaining the properties of the source materials. HM can supply high-quality molybdenum sputtering targets with advanced technology, ensuring high purity, high density, and small average grain size.

Circular Molybdenum Sputtering Target
Rotary Molybdenum Sputtering Target
Custom Molybdenum Sputtering Target

Molybdenum Sputtering Target Material Chemical Composition

Material	Mo	Impurities, (≤%）
Material	Mo	Al	Ca	Fe	Mg	Ni	Si	C	N	O	La2O3
Mo1	Bal.	0.002	0.002	0.010	0.002	0.005	0.01	0.01	0.003	0.008	–
Mo2	Bal.	0.005	0.004	0.015	0.005	0.005	0.01	0.02	0.003	0.020	–
MoLa	Bal.	0.002	0.002	0.015	0.005	0.005	0.01	0.02	0.005	–	0.1~1.8
Note: The O content of MoLa alloy can be tested according to customer requirements.

Molybdenum Sputtering Target Specifications

Material Type	Molybdenum	Coefficient of Thermal Expansion	4.8 x 10-6/K
Symbol	Mo	Theoretical Density (g/cc)	10.2
Atomic Weight	95.96	Z Ratio	0.257
Atomic Number	42	Sputter	DC
Color/Appearance	Grey, Metallic	Max Power Density (Watts/Square Inch)	150*
Thermal Conductivity	139 W/m.K	Type of Bond	Indium, Elastomer
Melting Point (°C)	2,617	Comments	Films smooth, hard.

Molybdenum Sputtering Target Stock Dimensions

Circular Sputtering Targets	Diameter	1.0″ 2.0″ 3.0″ 4.0″ 5.0″ 6.0″ up to 21″
Rectangular Sputtering Targets	Width x Length	5″ x 12″ 5””x 15″ 5″ x 20″ 5″ x 22″ 6″ x 20″
Thickness		0.125″, 0.25″

Molybdenum Sputtering Target Production Process

Generally prepared using the powder metallurgy method, the purity of molybdenum powder should be above 99.95%. The specific process is as follows:

Put the molybdenum powder in the vacuum heat treatment furnace for pre-gassing, then introduce hydrogen and continue heating for degassing.
The degassed molybdenum powder is sintered once by vacuum hot pressing.
The primary sintered product is passed through a hot isostatic press to complete the secondary sintering.
After the secondary sintering, the whole surface of the product is ground by machining to get the final product.

Molybdenum Sputtering Target Features

High Purity: Up to 99.99% purity
High Density: Density close to the theoretical density of 10.22 g/cm3
Uniform Microstructure: Ensuring uniform erosion during the sputtering process
Small Average Grain Size: Ensuring the uniformity of the target

Molybdenum Sputtering Target Applications

Semiconductor Manufacturing: Molybdenum sputtering targets are used to deposit conductive and shielding layers, especially in producing integrated circuits and microelectronic devices.
Flat Panel Displays: Molybdenum sputtering targets are used to form electrodes and wiring materials in displays such as TFT-LCDs (thin-film transistor liquid crystal displays) and OLEDs (organic light-emitting diodes).
Thin-Film Solar Cells: Molybdenum sputtering targets are used in the back-electrode layer of CIGS (copper indium gallium selenide) thin-film solar cells to improve the efficiency and stability of the cells.
Medical Imaging Equipment: Molybdenum sputtering targets are used in X-ray tubes to generate high-quality X-rays and ensure the clarity and stability of imaging.
Glass Coating: Molybdenum sputtering targets are used for coating glass surfaces to enhance the wear resistance and corrosion resistance of glass.

Molybdenum Sputtering Target Packaging

The Molybdenum Sputtering Target is carefully placed in wooden cases or cartons with additional support from soft materials to prevent any shifting during transportation. This packaging method guarantees the integrity of the products throughout the delivery process.

Molybdenum Properties

Item	Value
Atomic number	42
Crystal structure	Body centred cubic
Electronic structure	Kr 4d⁵ 5s¹
Valences shown	2, 3, 4, 5, 6
Atomic weight( amu )	95.94
Thermal neutron absorption cross-section( Barns )	2.65
Photo-electric work function( eV )	4.2
Natural isotope distribution( Mass No./% )	95/ 15.9
Natural isotope distribution( Mass No./% )	96/ 16.7
Natural isotope distribution( Mass No./% )	98/ 24.1
Natural isotope distribution( Mass No./% )	97/ 9.6
Natural isotope distribution( Mass No./% )	92/ 14.8
Natural isotope distribution( Mass No./% )	94/ 9.3
Natural isotope distribution( Mass No./% )	100/ 9.6
Atomic radius – Goldschmidt( nm )	0.14
Ionisation potential( No./eV )	2/ 16.15
Ionisation potential( No./eV )	5/ 61.2
Ionisation potential( No./eV )	Jun-68
Ionisation potential( No./eV )	1/ 7.10
Ionisation potential( No./eV )	3/ 27.2
Ionisation potential( No./eV )	4/ 46.4

Item	Value
Material condition / Temper	Annealed (Soft)
Material condition / Temper	Un-annealed (Hard)
Poisson’s ratio	0.293
Poisson’s ratio	0.293
Bulk modulus( GPa )	261.2
Bulk modulus( GPa )	261.2
Tensile modulus( GPa )	324.8
Tensile modulus( GPa )	324.8
Hardness – Vickers( kgf mm⁻² )	250
Hardness – Vickers( kgf mm⁻² )	200
Tensile strength( MPa )	485-550
Tensile strength( MPa )	620-690
Yield strength( MPa )	550
Yield strength( MPa )	415-450

Item	Value
Electrical resistivity( µOhmcm )	5.7@20@20°C
Superconductivity critical temperature( K )	0.915
Temperature coefficient( K⁻¹ )	0.00435@0-100°C
Thermal emf against Pt (cold 0C – hot 100C)( mV )	1.45

Item	Value
Boiling point( °C)	4612
Density( gcm⁻³ )	10.22@20°C

Item	Value
Melting point( °C )	2617
Latent heat of evaporation( J g⁻¹ )	6153
Latent heat of fusion( J g⁻¹ )	290
Specific heat( J K⁻¹ kg⁻¹ )	251@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	138@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	5.1@0-100°C

Download

SAFT DATA SHEET (SDS) – Molybdenum Metal

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To customize your molybdenum sputtering target, please provide the following details:

Diameter (for the circular sputtering targets)
Width × Length (for the rectangular sputtering targets)
Thcikness (for the sputtering targets)
Purity of the material
Backing Plate (If bonding service is required, please specify the material and dimensions of the backing plate.）
Quantity of the products you need
Alternatively, you can provide a drawing with your specifications.

Once we have these details, we can provide you with a quote within 24 hours.

We carry a wide variety of molybdenum and molybdenum alloy products in stock, and for these, there is generally no minimum order requirement. However, for custom orders, we typically set a minimum order value of $200. The lead time for stock items is usually 1-2 weeks, while custom orders usually take 3-4 weeks, depending on the specifics of the order.

DFARS (Defense Federal Acquisition Regulation Supplement) compliance is primarily concerned with the sourcing of materials for defense-related applications in the United States. According to DFARS, certain materials used in defense must be sourced from the United States or qualifying countries.

If you have specific molybdenum materials that are subject to DFARS, please let us know in advance and we will confirm.

At Heeger Materials Inc., we take this responsibility seriously. We adhere to all applicable laws and regulations, including Section 1502 of the Dodd-Frank Act. Our company operates with a strict code of ethics and is committed to only partnering with suppliers who share our dedication to responsible sourcing. We support the initiatives and programs aimed at promoting “conflict-free” supply chains and work diligently to ensure that our products meet these standards.

Heeger Materials Inc., established in 2016 in Colorado, USA, is a specialized supplier and manufacturer of tantalum and tantalum alloys. With extensive expertise in supply and export, we offer competitive pricing and customized solutions tailored to specific requirements, ensuring outstanding quality and customer satisfaction. As a professional provider of refractory metals, specialty alloys, spherical powders, and various advanced materials, we serve the research, development, and large-scale industrial production needs of the scientific and industrial sectors.

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Sputtering Targets Products

Heeger Metal offers a wide selection of high-performance sputtering targets made from materials like titanium, copper, aluminum, and rare earth metals. Our custom sputtering targets are precision-engineered to meet the demands of industries such as semiconductor manufacturing, photovoltaic, and electronics. With superior purity and consistency, our sputtering targets deliver exceptional film deposition performance, making them ideal for thin-film coating, sputtering, and PVD (Physical Vapor Deposition) applications.

Other Molybdenum Products

We offer a wide range of molybdenum and molybdenum alloy products, from powders to finished parts, with customization options available. Please refer to the list for our common products.