Niob-Sputtering-Target
Niobium Sputterig Target
Reinheit: 99,5%-99,99%
Material: R04200, R04210
Niobium Sputtering Target is made of high-purity niobium metal material, possessing small grain size. These properties enables the formation of uniform and dense films. As a leading supplier and manufacturer of premium niobium products, Heeger Materials leverages advanced machining centers to deliver high-precision niobium sputtering targets for wide ranges of applications.
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Niobium Sputtering Data Sheet
| Referenz: | HMST16 |
|---|---|
| Material: | R04200, R04210 |
| Reinheit: | 99.5%-99.99% |
| Die Dichte: | 8,57 g/cm3 |
| Die Form: | Flat, Rotary, or Customized |
| Bonding: | Unbongidng or Bonding |
Niob-Sputtering-Target
Niobium is a rare, silvery-gray transition metal with excellent corrosion resistance, electric conductivity, and high-temperature stability. Niob-Sputtering-Target can usually reach a purity of more than 99.95% and have a small grain size, which ensures the quality of the coating. Niobium Sputtering Target is commonly applied in semiconductor manufacturing, thin film coatings, electronic components, etc. HM can offer bonding services according to specific requirements.
Niobium Sputtering Target_Round Shape 
Niobium Sputtering Target_Special Shape 
Niobium Sputtering Target_Rotary Type
Niobium Sputtering Target Material Chemical Composition
| Material | Hauptelement (%) | Verunreinigungen (≤%) | ||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Nb | Fe | Si | Ni | W | Mo | Ti | Ta | Zr | Hf | O | C | H | N | |
| RO4200 | Bal. | 0.0040 | 0.0040 | 0.0020 | 0.0050 | 0.0050 | 0.0020 | 0.0700 | 0.0200 | 0.0200 | 0.0150 | 0.0040 | 0.0015 | 0.0030 |
| RO4210 | Bal. | 0.0100 | 0.0100 | 0.0050 | 0.0200 | 0.0100 | 0.0040 | 0.1000 | 0.0200 | 0.0200 | 0.0200 | 0.0100 | 0.0015 | 0.0100 |
Niobium Sputtering Target Specifications
| Material Type | Niobium | Coefficient of Thermal Expansion | 7.3 x 10-6/K |
|---|---|---|---|
| Symbol | Nb | Theoretical Density (g/cc) | 8.57 |
| Atomic Weight | 92.90638 | Z Ratio | 0.492 |
| Atomic Number | 41 | Sputter | DC |
| Color/Appearance | Gray, Metallic | Max Power Density (Watts/Square Inch) | 100* |
| Wärmeleitfähigkeit | 54 W/m.K | Type of Bond | Indium, Elastomer |
| Melting Point (°C) | 2,468 | Comments | Attacks W source. |
Niobium Sputtering Target Stock Dimensions
| Circular Sputtering Targets | Durchmesser | 1.0″ 2.0″ 3.0″ 4.0″ 5.0″ 6.0″ up to 21″ |
|---|---|---|
| Rectangular Sputtering Targets | Width x Length | 5″ x 12″ 5””x 15″ 5″ x 20″ 5″ x 22″ 6″ x 20″ |
| Dicke | 0.125″, 0.25″ | |
Niobium Sputtering Target Production Process
Generally prepared by powder metallurgy method, the purity of Niobium-Pulver should be above 99.95%. The specific process is as follows:
- Put the niobium powder in the vacuum heat treatment furnace for pre-gassing, then introduce hydrogen and continue heating for degassing.
- The degassed niobium powder is sintered once by vacuum hot pressing.
- The primary sintered product is passed through a hot isostatic press to complete the secondary sintering.
- After the secondary sintering, the whole surface of the product is ground by machining to get the final product.
Niobium Sputtering Target Applications
- Flat Panel Displays and Liquid Crystal Displays: Niobium sputtering targets are used to manufacture high-quality displays that provide clear images and high contrast.
- Optical Lenses: In optical devices, niobium sputtering targets are used for coating to improve light transmission and durability.
- Solar Cells: Niobium sputtering targets are also used to produce solar cells to improve photovoltaic conversion efficiency.
- Glass Coating: Niobium sputtering targets are used in the surface coating of energy-saving glass with anti-reflective and heat-insulating properties.
Niobium Sputtering Target Packaging
The Niobium Sputtering Target is carefully placed in wooden cases or cartons with additional support from soft materials to prevent any shifting during transportation. This packaging method guarantees the integrity of the products throughout the delivery process.
Niobium Eigenschaften
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Andere Niobiumprodukte
Heeger Metal bietet ein umfassendes Sortiment an Produkten aus Niob und Nioblegierungen an, darunter Pulver und Fertigteile, die auch kundenspezifisch angepasst werden können. Diese Werkstoffe sind für ihre außergewöhnliche Festigkeit, Korrosionsbeständigkeit und Hochtemperaturstabilität bekannt und eignen sich ideal für Anwendungen in der Luft- und Raumfahrt, der Elektronik und der chemischen Verarbeitung. Unser hochreines Niob gewährleistet zuverlässige Leistung und Haltbarkeit in den anspruchsvollsten Umgebungen.
Sputtering Targets Products
Heeger Metal offers a wide selection of high-performance sputtering targets made from materials like titanium, copper, aluminum, and rare earth metals. Our custom sputtering targets are precision-engineered to meet the demands of industries such as semiconductor manufacturing, photovoltaics, and electronics. With superior purity and consistency, our sputtering targets deliver exceptional film deposition performance, making them ideal for thin-film coating, sputtering, and PVD (Physical Vapor Deposition) applications.
