Blanco para sputtering de oro
Gold Sputtering Target Purity: ≥99.95%, or customized Gold Sputtering Target is made of high-purity gold metal through precise techniques and is…
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Cátodos para sputtering de molibdeno
Cátodos de molibdeno para sputtering Pureza: 99.95%-99.99% Material: Mo361 puro, MoTZM (Mo364), Mo-Lanthanoxid (ML) El cátodo de molibdeno para sputtering es un material de deposición de película fina,...
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Cátodos para sputtering de niobio
Niobium Sputterig Target Purity: 99.5%-99.99% Material: R04200, R04210 Niobium Sputtering Target is made of high-purity niobium metal material, possessing small grain…
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Cátodos para sputtering de paladio
Palladium Sputtering Target Purity: ≥99.95%, or customized Shape: Disc, Rectangular, Tube, or customized Palladium Sputtering Target is made from high-purity palladium…
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Blanco para sputtering de platino
Platinum Sputtering Target Purity: ≥99.95% or ≥99.99% Shape: Disc, Rectangular, Tube, or customized Platinum Sputtering Target is made from high-purity platinum…
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Cátodos para sputtering de tántalo
Tantalum Sputtering Target Purity: 99.9%, 99.95%, 99.99%, 99.999% Material: R05200, R05400 Tantalum Sputtering Target is made from high-purity tantalum material through…
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Blanco de titanio para sputtering
Titanium Sputtering Target Material: Gr.1, Gr.2, Gr.3, Gr.7, Gr.9, Gr.12, Gr.16, etc. Purity: 99.95%-99.995% Titanium Sputtering Target is one of the…
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Cátodos de tungsteno para sputtering
Tungsten Sputtering Target Material: Pure Tungsten Purity: 99%-99.999% Tungsten Sputtering Target is made of high-purity tungsten powder, as high as 99.999%….
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Cátodos para sputtering de circonio
Zirconium Sputtering Target Material: Zr702, Zr704, Zr705 Purity: 99.95%-99.99% Zirconium Sputtering Target is made from high-performance zirconium metal or alloys in…